Investigation of electron-induced cross-linking of self-assembled monolayers by scanning tunneling microscopy

• Patrick Stohmann,
• Sascha Koch,
• Yang Yang,
• Christopher David Kaiser,
• Julian Ehrens,
• Jürgen Schnack,
• Niklas Biere,
• Dario Anselmetti,
• Armin Gölzhäuser and
• Xianghui Zhang

Beilstein J. Nanotechnol. 2022, 13, 462–471, doi:10.3762/bjnano.13.39

• Abstract Ultrathin membranes with subnanometer pores enabling molecular size-selective separation were generated on surfaces via electron-induced cross-linking of self-assembled monolayers (SAMs). The evolution of p-terphenylthiol (TPT) SAMs on Au(111) surfaces into cross-linked monolayers was observed

• simulations, we propose that these voids may correspond to free volumes inside a cross-linked monolayer. Keywords: carbon nanomembranes; electron-induced cross-linking; scanning tunneling microscopy; self-assembled monolayers; subnanometer pores; Introduction Electron-induced chemistry plays an essential

• values determined by STM are smaller than the areal density of ≈7 × 1017 m−2 and the pore diameter of 0.7 ± 0.1 nm determined using AFM [36]. This is mainly due to different imaging mechanisms and different threshold definitions used for pore determination. Finally, the evolution of electron-induced

Exploring the fabrication and transfer mechanism of metallic nanostructures on carbon nanomembranes via focused electron beam induced processing

• Christian Preischl,
• Linh Hoang Le,
• Elif Bilgilisoy,
• Armin Gölzhäuser and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2021, 12, 319–329, doi:10.3762/bjnano.12.26

• high purity. Remarkably, the EBISA process exhibits a strong time dependence, which is analyzed in detail for different electron doses. This time dependence is a new phenomenon, which, to the best of our knowledge, was not reported before. The electron-induced cross-linking of the SAM caused by the

• 2D materials used in this approach are ultrathin carbon nanomembranes (CNMs) [21]. CNMs are versatile 2D organic materials with high thermal [22] and mechanical [23] stability that can be produced by electron-induced cross-linking of aromatic self-assembled monolayers (SAMs) [24] and transferred onto

• aromatic molecules, which are chemically bound to a Au or Ag surface via either thiol [26] or carboxylic [28][29] anchor groups. Via FEBIP, the SAM can be functionalized with metallic nanostructures and subsequently be transformed into a CNM by electron-induced cross-linking. Afterwards, the resulting

Amplified cross-linking efficiency of self-assembled monolayers through targeted dissociative electron attachment for the production of carbon nanomembranes

• Sascha Koch,
• Christopher D. Kaiser,
• Paul Penner,
• Michael Barclay,
• Lena Frommeyer,
• Daniel Emmrich,
• Patrick Stohmann,
• Tarek Abu-Husein,
• Andreas Terfort,
• D. Howard Fairbrother,
• Oddur Ingólfsson and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2017, 8, 2562–2571, doi:10.3762/bjnano.8.256

• may thus lead to a significantly faster conversion of the respective SAMs into carbon nanomembranes (CNMs) without the need for an increased current density. XPS data support the notation that DEA sensitization may be used to achieve more efficient electron-induced cross-linking of SAMs, revealing

• electron-induced cross-linking of specific aromatic self-assembled monolayers (SAMs) [4][5][6][7] and for their subsequent release from the substrate, multilayer stacking, and conversion to conductive carbon layers [8][9]. The cross-linking is typically achieved through irradiation with electrons in the

Fabrication of carbon nanomembranes by helium ion beam lithography

• Xianghui Zhang,
• Henning Vieker,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2014, 5, 188–194, doi:10.3762/bjnano.5.20

• ) lithography have been utilized to fabricate CNMs from SAMs [11][12]. The EUV photon induced cross-linking is, for that matter, related to secondary electrons generated by the photoemission process [11]. Turchanin et al. investigated the electron induced cross-linking of biphenylthiol (BPT) SAMs on gold with

Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

• Zhe She,
• Andrea DiFalco,
• Georg Hähner and
• Manfred Buck

Beilstein J. Nanotechnol. 2012, 3, 101–113, doi:10.3762/bjnano.3.11

• highly passivating SAM and then introduce defects afterwards in a controlled way. Deposition on e-beam-patterned SAMs: As discussed above, the extent to which defects in the SAM are modified by electron-induced cross-linking is crucial for the spatial resolution. Therefore, besides the parameters for the

Mechanical characterization of carbon nanomembranes from self-assembled monolayers

• Xianghui Zhang,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2011, 2, 826–833, doi:10.3762/bjnano.2.92

• nanoparticle assemblies at the fluid interfaces [7][8]. Freestanding nanomembranes with thicknesses from 20 to 70 nm were achieved by these approaches. Eck et al. reported the fabrication of carbon nanomembranes (CNMs) with a thickness of 1 nm by electron-induced cross-linking of aromatic self-assembled